B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.

BELMONT, Calif. — Look for Nikon Inc. to introduce a new version of its lithography tools, based on 193-nanometer argon-fluoride (ArF) technology, at next month's Semicon West trade show, according to ...

ASML has just officially shipped its very first High-NA EUV lithography scanner to Intel, with the sparkling new Twinscan EXE:5000 extreme ultraviolet (EUV) scanner being the first High-NA scanner ...

TOKYO, Oct. 1, 2025 /PRNewswire/ -- Nikon Corporation is reaffirming the availability of its Digital Lithography System, DSP-100, with orders having commenced in July 2025. This system is specifically ...

In a milestone for the global semiconductor industry, Multibeam Corp. today introduced the MB platform, a first-of-a-kind Multicolumn E-Beam Lithography (MEBL) to make chip factories better. Their new ...

A disclosure on China's government procurement platform shows that Shanghai Micro Electronics Equipment (SMEE) has won a ...

(MENAFN- GlobeNewsWire - Nasdaq) First HBA lithography system in the U.S. harnesses 65,000 parallel beams for unmatched flexibility, rapid prototyping and die-level traceability FORT WORTH, Texas, Oct ...