Gigaphoton has released a 90W argon-fluoride excimer laser for use in next-generation semiconductor manufacturing. With a power output of 90 W and a repetition rate of 6000 Hz, the new ArF excimer ...
OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton, Inc. , a major lithography light source manufacturer, announced that the company will begin shipping the GT63A, the next-generation ArF excimer laser for ...
Lithography scanner light source provider demonstrates capability for the future generation of larger wafers. OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a major lithography light source ...
New measurements of key wavelengths of ultraviolet light—down to a few millionths of a nanometer—are among the most precise ever reported and are improving calibrations of microlithography tools used ...
There is a pressing need to find convenient and effective ways to generate deep ultraviolet light for techniques such as photoemission spectroscopy and semiconductor lithography. Frequency conversion ...
A research team led by Prof. LIANG Xu at the Hefei Institutes of Physical Science, Chinese Academy of Sciences, has developed an ultra-compact excimer laser—roughly the size of a thermos bottle. The ...
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